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  3. Thesis
Please use this identifier to cite or link to this item: http://localhost:80/xmlui/handle/123456789/10732
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dc.contributor.authorSiddiqui, Jamil Ahmad-
dc.date.accessioned2018-04-05T05:48:20Z-
dc.date.accessioned2020-04-15T00:37:05Z-
dc.date.available2020-04-15T00:37:05Z-
dc.date.issued2017-
dc.identifier.urihttp://142.54.178.187:9060/xmlui/handle/123456789/10732-
dc.description.abstractN/Aen_US
dc.description.sponsorshipHigher Education Commission, Pakistanen_US
dc.language.isoenen_US
dc.publisherGC UNIVERSITY LAHOREen_US
dc.subjectNatural Sciencesen_US
dc.titleSynthesis of Tantalum and Niobium Based Nitride and Oxy Nitride Films in Plasma Environmenten_US
dc.typeThesisen_US
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