ANNEALING EFFECTS ON SURFACE MORPHOLOGY, THICKNESS AND CHEMICAL PHASES OF Sr-Cu-O THIN FILM DEPOSITED BY MOCVD

Abstract

The annealing process for obtaining SrCu2O2 out of the as-deposited Sr-Cu-O films by MOCVD was studied. Whatever the deposition condition may be, the as-deposited films are always composed of SrCO3 and CuO. As-deposited films were annealed in various gaseous atmospheres at different temperatures and for different annealing durations to obtain pure SrCu2O2 phase. Annealing effects on the as-deposited film include; crystallization of the film, transformation of the chemical phases, sintering of the grains, formation of cracks, reduction of the film thickness and diffusion of film contents into the substrate. Transformations of chemical phases depend on oxygen partial pressure, temperature and duration of annealing and rate of cooling. Formations of cracks were found to depend on heating and cooling rate and duration of annealing. Diffusion of film content into the substrate depends on duration and temperature of annealing and on the nature of substrate. Duration of annealing for obtaining pure SrCu2O2 phase also depends on annealing temperature as well as on heating and cooling rate